Galvanostatic deposition of thin films of cadmium and tellurium

Abstract

Thin films containing cadmium and tellurium, not necessarily present as the compound cadmium telluride, were electrodeposited galvanostatically onto a titanium rotating disc electrode from an aqueous solution containing CdS0₄, TeO₂ and H₂SO₄. The films were analysed by atomic absorption spectroscopy and the dependence of the film composition on the deposition current density determined. The cadmium and the tellurium deposited independently of each other, and the deposition system can be classified as a regular alloy plating system. Films of widely varying composition were deposited.