Phosphorus fertiliser placement for lupins in southern New South Wales
Australian Journal of Experimental Agriculture
43(1) 79 - 86
Published: 24 February 2003
Abstract
Research in Western Australia and South Australia indicated that fertiliser phosphorus (P) banded below the seed of narrow leaf lupin (Lupinus angustifolius L.) at sowing was a more effective method of applying P fertiliser than the usual placement of P with the seed. This technology has not been investigated in southern New South Wales where lupins have been known to be unresponsive to fertiliser P.We conducted 4 field experiments to examine the effect on lupin yield of applying 6 rates of P (0, 5, 10, 15, 20 and 40 kg/ha) either by placement with or below the seed. To further test responsiveness to P, an additional set of treatments was used; applying P at 40 kg/ha before sowing and then placing additional P below the seed at the 6 rates of application. The grain yield of lupin was increased by P application at all sites, despite the medium to high P status of 3 of the 4 sites used in these experiments. However, the technique of banding P fertiliser below the seed depth rather than placing it in direct seed contact had only a small advantage in grain yield responsiveness to applied fertiliser P (P = 0.09). Fitted response curves indicated that when P was applied at 15 kg/ha, grain yield increased by 60 kg/ha at one site and 30 kg/ha at the other 3 sites, if P was deep-placed rather than applied in seed contact. This advantage of deep placement of P fertiliser was much smaller than has been reported in Western Australia.
Placement of P below the seed of lupin when sown on the red earth and red-brown earth soils of southern New South Wales slightly enhanced the availability of fertiliser P. This applied even when sowing was quite shallow (2–3 cm), provided recommended rates of P fertiliser were used at conventional row spacing (17 cm). Separation of seed and fertiliser to avoid reduced germination may be an advantage when using double row spacing and higher P application rates.
Keywords: deep placement,
https://doi.org/10.1071/EA01201
© CSIRO 2003