
TY  - JOUR
A1  - Danaher, WJ 
A1  - Lyons, LE 
T1  - Galvanostatic deposition of thin films of cadmium and tellurium
JF  - Australian Journal of Chemistry
JO  - Aust. J. Chem.
Y1  - 1983
VL  - 36
IS  - 5
SP  - 1011
EP  - 1016
KW  - 
UR  - https://doi.org/10.1071/CH9831011 
N2  - Thin films containing cadmium and tellurium, not necessarily present as the compound cadmium telluride, were electrodeposited galvanostatically onto a titanium rotating disc electrode from an aqueous solution containing CdS04, TeO2 and H2SO4. The films were analysed by atomic absorption spectroscopy and the dependence of the film composition on the deposition current density determined. The cadmium and the tellurium deposited independently of each other, and the deposition system can be classified as a regular alloy plating system. Films of widely varying composition were deposited. 
ER  -

