Fabrication of Ag@AgCl with Enhanced Plasmonic Photocatalysis Performance via a Deep Eutectic Solvent
Jianhua Ge A B , Yuchong Chen A , Jing Xu A , Yujie Liu A , Long Zhang A and Fugeng Zha A
+ Author Affiliations
- Author Affiliations
A School of Earth Science and Environmental Engineering, Anhui University of Science and Technology, Huainan 232001, China.
B Corresponding author. Email: gejianhua13@163.com
Australian Journal of Chemistry 72(3) 200-205 https://doi.org/10.1071/CH18386
Submitted: 5 August 2018 Accepted: 13 November 2018 Published: 6 December 2018
Abstract
The plasmonic photocatalyst Ag@AgCl was successfully prepared through a facile solvothermal method via a deep eutectic solvent (DES), which is composed of choline chloride and urea. X-Ray diffraction, scanning electron microscopy, energy-dispersive X-ray, element-mapping, X-ray photoelectron spectroscopy, N2 absorption–desorption, and UV-vis diffuse reflectance techniques were adopted to analyse the performance of the plasmonic photocatalyst. Characterisation results indicated that the DES not only served as a solvent and Cl source, but also as a reductant. Meanwhile, the probable mechanism for the formation of Ag@AgCl is discussed, which revealed a visible light enhanced photocatalytic property for the degradation of benzidine. Furthermore, the photocatalyst showed no decrease in its catalytic activity even after five cycles of operation. Finally, a possible photocatalytic oxidation mechanism of Ag@AgCl is proposed.
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